DocumentCode
330733
Title
The Implementation Of Sub-150nm Contact Hole Pattern By Resist Flow Process
Author
Kim, Jin-Soo ; Choi, Chang-II ; Bok, CheoCKyu ; Ahn, Chang-Nam ; Kim, Hyeong-Soo ; Baik, Ki-Ho
Author_Institution
Hyundai Electronics Industries Co., Ltd.
fYear
1998
fDate
13-16 July 1998
Firstpage
259
Lastpage
260
Keywords
Charge carrier processes; Electron beams; Electronics industry; Image motion analysis; Inspection; Lithography; Mass production; Resists; Temperature; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location
Kyoungju, South Korea
Print_ISBN
4-930813-83-2
Type
conf
DOI
10.1109/IMNC.1998.730071
Filename
730071
Link To Document