Title :
Challenges To 0.1 /spl mu/m Resolution Capability In ArF Single Layer Resist Process With Weak Resolution Enhancement Techniques
Author :
Takahashi, Makoto ; Kishimura, Shinji ; Ohfuji, Takeshi ; Sasago, Masaru
Author_Institution :
Association of Super-Advanced Electronics Technologies
Keywords :
Apertures; Focusing; Lighting; Resists;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730072
