• DocumentCode
    330735
  • Title

    Study Of Bottom Antireflective Coating Process Using A High-Transparency Resist For ArF Excimer Laser Lithography

  • Author

    Kishimura, Shinji ; Takahashi, Makoto ; Ohfuji, Takeshi ; Sasago, Masaru

  • Author_Institution
    Association of Super-Advanced Electronics Technologies
  • fYear
    1998
  • fDate
    13-16 July 1998
  • Firstpage
    263
  • Lastpage
    264
  • Keywords
    Chemicals; Coatings; Controllability; Etching; Interference; Lithography; Reflectivity; Resists; Surfaces; Thermal degradation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1998 International
  • Conference_Location
    Kyoungju, South Korea
  • Print_ISBN
    4-930813-83-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1998.730073
  • Filename
    730073
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=330735