Title :
Positive-Tone E-Beam Lithography With Surface Silylation Of Negative-Tone Commercial Photoresists Sal 601 And AZPN 114
Author :
Tegou, Evangelia ; Gogolides, Evangelos ; Argitis, Panagiotis ; Cui, Zheng
Author_Institution :
Institute of Microelectronics IMEL
Keywords :
Electron beams; Etching; Laboratories; Lithography; Microelectronics; Microstructure; Paramagnetic resonance; Plasma applications; Resists; Solvents;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730074
