Resist Development Process For Sub-0.15/spl mu/m Lithography By KrF Imaging

Author

Matsunaga, K. ; Kawamura, D. ; Mimotogi, S. ; Azuma, T. ; Onishi, Y.

Author_Institution

Toshiba Corporation

fYear

1998

fDate

13-16 July 1998

Firstpage

319

Lastpage

320

Keywords

Chemical processes; Data analysis; High-resolution imaging; Image resolution; Lithography; Resists;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

DOI

10.1109/IMNC.1998.730101

Filename

730101

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