DocumentCode

330764

Title

Silicon Containing Photoresists For ArF Excimer Laser Lithography

Author

Kim, Young-Dae ; Park, Sang-Jin ; Haiwon Lee ; Lee, Haiwon ; Dong-Won Jung ; Sang-Jun Choi

Author_Institution

Hanyang University

fYear

1998

fDate

13-16 July 1998

Firstpage

323

Lastpage

324

Keywords

Chemical lasers; Chemistry; Lithography; Microelectronics; Optical materials; Polymers; Research and development; Resists; Semiconductor lasers; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.730103

Filename

730103