• DocumentCode
    330769
  • Title

    Fabrication Of Nanometer-Order Dot Patterns By Lift-Off Using Fullerene-Incorporated Bilayer Resist System

  • Author

    Ishii, Tetsuyoshi ; Tanaka, Hirotaka ; Kuramochi, Eiichi ; Tamamura, Toshiaki

  • Author_Institution
    NTT Opto-Electronics Laboratories
  • fYear
    1998
  • fDate
    13-16 July 1998
  • Firstpage
    333
  • Lastpage
    334
  • Keywords
    Control systems; Electron beams; Laboratories; Lithography; Optical arrays; Optical device fabrication; Quantum dot lasers; Resists; US Department of Transportation; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1998 International
  • Conference_Location
    Kyoungju, South Korea
  • Print_ISBN
    4-930813-83-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1998.730108
  • Filename
    730108
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=330769