• DocumentCode
    3317221
  • Title

    Evidence and modeling of anomalous low concentration arsenic inactivation

  • Author

    Borucki, L.J.

  • Author_Institution
    Motorola Corp., Mesa, AZ, USA
  • fYear
    1990
  • fDate
    9-12 Dec. 1990
  • Firstpage
    753
  • Lastpage
    756
  • Abstract
    Experimental results are discussed that indicate that implanted arsenic is sometimes transported by large populations of a mobile species that is neutral at room temperature, causing inactivation throughout the profile and unexpectedly high sheet resistances. This transport path occurs in strictly low concentration diffusion and in the early stages of high concentration diffusion, prior to precipitation. Novel models are presented that fit low concentration chemical profiles, anomalous electrical data, and early high concentration data. One of the models successfully predicts sheet resistances in high concentration profiles that have not yet shown evidence of precipitation, suggesting that interstitial arsenic is the precursor to normal high concentration inactivation.<>
  • Keywords
    arsenic; diffusion in solids; doping profiles; elemental semiconductors; semiconductor doping; Si:As; elemental semiconductors; high concentration diffusion; inactivation; low concentration chemical profiles; mobile species; sheet resistances; transport path; Chemicals; Predictive models; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1990. IEDM '90. Technical Digest., International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.1990.237091
  • Filename
    237091