DocumentCode
3317221
Title
Evidence and modeling of anomalous low concentration arsenic inactivation
Author
Borucki, L.J.
Author_Institution
Motorola Corp., Mesa, AZ, USA
fYear
1990
fDate
9-12 Dec. 1990
Firstpage
753
Lastpage
756
Abstract
Experimental results are discussed that indicate that implanted arsenic is sometimes transported by large populations of a mobile species that is neutral at room temperature, causing inactivation throughout the profile and unexpectedly high sheet resistances. This transport path occurs in strictly low concentration diffusion and in the early stages of high concentration diffusion, prior to precipitation. Novel models are presented that fit low concentration chemical profiles, anomalous electrical data, and early high concentration data. One of the models successfully predicts sheet resistances in high concentration profiles that have not yet shown evidence of precipitation, suggesting that interstitial arsenic is the precursor to normal high concentration inactivation.<>
Keywords
arsenic; diffusion in solids; doping profiles; elemental semiconductors; semiconductor doping; Si:As; elemental semiconductors; high concentration diffusion; inactivation; low concentration chemical profiles; mobile species; sheet resistances; transport path; Chemicals; Predictive models; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1990. IEDM '90. Technical Digest., International
Conference_Location
San Francisco, CA, USA
ISSN
0163-1918
Type
conf
DOI
10.1109/IEDM.1990.237091
Filename
237091
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