DocumentCode :
3317571
Title :
A novel Si-based LWIR detector: the SiGe/Si heterojunction internal photoemission detector
Author :
Lin, T.L. ; Jones, E.W. ; Ksendzov, A. ; Dejewski, S.M. ; Fathauer, R.W. ; Krabach, T.N. ; Maserjian, J.
Author_Institution :
Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
fYear :
1990
fDate :
9-12 Dec. 1990
Firstpage :
641
Lastpage :
644
Abstract :
A novel Si-based long-wavelength infrared (LWIR) detector, the SiGe/Si heterojunction internal photoemission (HIP) detector, has been demonstrated. The detection mechanism of the SiGe/Si HIP detector is infrared absorption in the degenerately doped p/sup +/-SiGe layer followed by internal photoemission of photoexcited holes over the heterojunction barrier. The p/sup +/-SiGe layers are grown by molecular beam epitaxy with boron concentrations up to 4*10/sup 20/ cm/sup -3/. The cutoff wavelength of this device can be tailored by varying the valence band offset between the SiGe alloy and Si, and thus can be extended into the long-wave infrared regime. The valence based offset can be adjusted by varying the Ge ratio in the SiGe layers. Results have been obtained from test devices with Ge composition ranging from 0.2 to 0.4, giving quantum efficiencies of 3-5% for a single pass in the 8-12 mu m region.<>
Keywords :
Ge-Si alloys; elemental semiconductors; infrared detectors; molecular beam epitaxial growth; p-n heterojunctions; photoemissive devices; semiconductor epitaxial layers; semiconductor growth; semiconductor materials; silicon; 3 to 5 percent; 8 to 12 micron; LWIR detector; SiGe-Si heterojunction; cutoff wavelength; detection mechanism; heterojunction internal photoemission detector; infrared absorption; long-wavelength IR detector; molecular beam epitaxy; photoexcited holes; quantum efficiencies; valence band offset; Boron; Electromagnetic wave absorption; Germanium silicon alloys; Heterojunctions; Hip; Infrared detectors; Molecular beam epitaxial growth; Photoelectricity; Silicon alloys; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1990. IEDM '90. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.1990.237117
Filename :
237117
Link To Document :
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