• DocumentCode
    331841
  • Title

    Techniques for monolithic integration of silica-based waveguide devices with optoelectronics

  • Author

    Bazylenko, Michael ; Gross, Mark ; Gauja, Eric ; Chu, Pak Lim

  • Author_Institution
    Sch. of Electr. Eng., New South Wales Univ., Sydney, NSW, Australia
  • Volume
    1
  • fYear
    1998
  • fDate
    1-4 Dec 1998
  • Firstpage
    38
  • Abstract
    A technique for monolithic integration of silica-based waveguides and optoelectronic components has been developed. The low temperature fabrication budget necessary to preserve the optoelectronic devices is obtained through the use the hollow cathode plasma enhanced CVD technique
  • Keywords
    integrated optoelectronics; optical communication equipment; optical fabrication; optical planar waveguides; plasma CVD; silicon compounds; wavelength division multiplexing; SiO2; hollow cathode plasma enhanced CVD technique; low temperature fabrication budget; monolithic integration; optoelectronic components; optoelectronic devices; optoelectronics; silica-based WDM planar waveguide devices; silica-based waveguides; Absorption; Annealing; Chemical vapor deposition; Electrodes; Monolithic integrated circuits; Nitrogen; Optical fiber devices; Plasma temperature; Silicon compounds; WDM networks;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Society Annual Meeting, 1998. LEOS '98. IEEE
  • Conference_Location
    Orlando, FL
  • Print_ISBN
    0-7803-4947-4
  • Type

    conf

  • DOI
    10.1109/LEOS.1998.737721
  • Filename
    737721
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=331841