Title :
Lithography mask made by silver nanorods
Author :
Chen, Sheng-Chung ; Wei, Yung-Chiang ; Pan, Heng-Yau ; Chiu, Kuo-Pin ; Shiu, Jr-Chau ; Kuo, Meng-Wei ; Chen, Chi-Ming
Author_Institution :
Dept. of Optoelectron. Eng., Far East Univ., Tainan, Taiwan
Abstract :
Lithography is a key process in fabrication of semiconductors, especially, it plays the main role in the size of integrated circuit. Because of the diffraction limit, the size of lithography image cannot be shrunk less than wavelength. In this paper, we offer a practical method to get a subwavelength image by using visible light. This method is based on the localized surface plasmon among silver nanorods, if the conditions of the polarization of light and configuration of the nanorod mask are optimized.
Keywords :
lithography; masks; nanorods; surface plasmons; integrated circuit; lithography mask; localized surface plasmon; semiconductor fabrication; silver nanorods; subwavelength image; visible light; Electrons; Light sources; Lithography; Nanostructures; Optical arrays; Optical coupling; Optical surface waves; Plasmons; Resonance; Silver; Lithography; subwavelength image;
Conference_Titel :
Computer Communication Control and Automation (3CA), 2010 International Symposium on
Conference_Location :
Tainan
Print_ISBN :
978-1-4244-5565-2
DOI :
10.1109/3CA.2010.5533391
