• DocumentCode
    3321741
  • Title

    An advanced methodology for the reporting of original adders for process tool defect monitoring

  • Author

    Zazado, Timothy J. ; Bottin, Jeffrey R.

  • Author_Institution
    Texas Instrum. Inc., Dallas, TX
  • fYear
    2005
  • fDate
    11-12 April 2005
  • Firstpage
    100
  • Lastpage
    106
  • Abstract
    With the increasing cost of bare silicon wafers, many IC manufacturers are choosing to run fewer and fewer process tool qualifications. This decision places an increasingly larger number of production wafers at risk from process tool excursions as well as an increasingly high demand on the dependability and consistency of the qualification data. In this paper, we describe our methodology of determining only original adders in process tool qualification. The importance of reporting only added defects to the process tool control chart was justified by showing a correlation between inline yield-enhancement charts and un-patterned tool qualifications. In the past, it has been very hard to correlate un-patterned charts to inline yield-limiting charts and also to final yield
  • Keywords
    control charts; integrated circuit manufacture; process monitoring; IC manufacturers; bare silicon wafers; inline yield-enhancement charts; original adders; process tool control chart; process tool defect monitoring; process tool excursions; process tool qualifications; production wafers; unpatterned tool qualifications; Costs; Inspection; Instruments; Laser beams; Lighting; Manufacturing processes; Monitoring; Optical scattering; Production; Qualifications;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 2005 IEEE/SEMI
  • Conference_Location
    Munich
  • Print_ISBN
    0-7803-8997-2
  • Type

    conf

  • DOI
    10.1109/ASMC.2005.1438775
  • Filename
    1438775