DocumentCode
3321741
Title
An advanced methodology for the reporting of original adders for process tool defect monitoring
Author
Zazado, Timothy J. ; Bottin, Jeffrey R.
Author_Institution
Texas Instrum. Inc., Dallas, TX
fYear
2005
fDate
11-12 April 2005
Firstpage
100
Lastpage
106
Abstract
With the increasing cost of bare silicon wafers, many IC manufacturers are choosing to run fewer and fewer process tool qualifications. This decision places an increasingly larger number of production wafers at risk from process tool excursions as well as an increasingly high demand on the dependability and consistency of the qualification data. In this paper, we describe our methodology of determining only original adders in process tool qualification. The importance of reporting only added defects to the process tool control chart was justified by showing a correlation between inline yield-enhancement charts and un-patterned tool qualifications. In the past, it has been very hard to correlate un-patterned charts to inline yield-limiting charts and also to final yield
Keywords
control charts; integrated circuit manufacture; process monitoring; IC manufacturers; bare silicon wafers; inline yield-enhancement charts; original adders; process tool control chart; process tool defect monitoring; process tool excursions; process tool qualifications; production wafers; unpatterned tool qualifications; Costs; Inspection; Instruments; Laser beams; Lighting; Manufacturing processes; Monitoring; Optical scattering; Production; Qualifications;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop, 2005 IEEE/SEMI
Conference_Location
Munich
Print_ISBN
0-7803-8997-2
Type
conf
DOI
10.1109/ASMC.2005.1438775
Filename
1438775
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