DocumentCode
3332040
Title
Layer removal from triso-coated particles with a cold plasma
Author
Van der Walt, Izak J. ; Nel, Johann T. ; Crouse, Philip L.
Author_Institution
South African Nucl. Energy Corp. Ltd., Pelindaba, South Africa
fYear
2010
fDate
20-24 June 2010
Firstpage
1
Lastpage
1
Abstract
Summary form only given. Generation IV nuclear reactors generally use small spherical UO2 particles that are coated with a multitude of layers including graphite and SiC. These particles are called TRISO-particles. During the manufacturing process some of the particles are scrapped because of defective layer formation or layer densities and are therefore outside the prescribed specifications. In order to recover the uranium contained inside such particles, a process was developed where the carbon and SiC layers was removed by oxidizing and etching it in a non-thermal plasma.
Keywords
carbon; plasma materials processing; silicon compounds; sputter etching; uranium compounds; C; SiC; TRISO-coated particles; UO2; cold plasma; defective layer formation; generation IV nuclear reactor; layer density; manufacturing process; nonthermal plasma; plasma etching; spherical particles; Africa; Chemical engineering; Etching; Manufacturing processes; Nuclear and plasma sciences; Nuclear power generation; Plasma applications; Plasma chemistry; Plasma density; Silicon carbide;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2010 Abstracts IEEE International Conference on
Conference_Location
Norfolk, VA
ISSN
0730-9244
Print_ISBN
978-1-4244-5474-7
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2010.5534157
Filename
5534157
Link To Document