• DocumentCode
    3332280
  • Title

    Performance of CNFET SRAM cells under diameter variation corners

  • Author

    Zhang, Zhe ; Liu, Yanmin ; Nyathi, Jabulani ; Delgado-Frias, José G.

  • Author_Institution
    Sch. of Electr. Eng. & Comput. Sci., Washington State Univ., Pullman, WA, USA
  • fYear
    2009
  • fDate
    2-5 Aug. 2009
  • Firstpage
    547
  • Lastpage
    550
  • Abstract
    In this paper three carbon nanotube FET based static memory cells are compared on read and write delays, energy consumption, and performance under diameter variation corners. The carbon nanotube FET is currently considered to be the possible ldquobeyond CMOSrdquo device due to its1-D transport properties that include low carrier scattering and ballistic transport. The memory cells are classified by their transistor count (6-, 7- and 8-transistor cell.) Under a nominal diameter of 1.51 nm, the 8-T cell has the lowest delay and energy consumption of 3.7 ps and 0.348 fJ, respectively. Simulations with transistor diameter variations show that small n-type device diameters result in significantly slow read and write delays. The 8-transistor cell dissipates the least energy when the transistor diameters range from 1.369 nm to 1.659 nm.
  • Keywords
    SRAM chips; ballistic transport; carbon nanotubes; field effect integrated circuits; nanotube devices; 1D transport properties; CNFET SRAM cells; ballistic transport; carbon nanotube FET; carrier scattering; size 1.51 nm; static memory cells; CMOS technology; CNTFETs; Carbon nanotubes; Delay; FinFETs; MOSFETs; Power dissipation; Random access memory; Read-write memory; Semiconductivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Circuits and Systems, 2009. MWSCAS '09. 52nd IEEE International Midwest Symposium on
  • Conference_Location
    Cancun
  • ISSN
    1548-3746
  • Print_ISBN
    978-1-4244-4479-3
  • Electronic_ISBN
    1548-3746
  • Type

    conf

  • DOI
    10.1109/MWSCAS.2009.5236035
  • Filename
    5236035