• DocumentCode
    3333603
  • Title

    New fabrication process for Capacitive Micromachined Ultrasonic Transducers

  • Author

    Huang, Y. ; Ergun, A.S. ; Hæggström, E. ; Khuri-Yakub, B.T.

  • Author_Institution
    Edward L. Ginzton Lab., Stanford Univ., CA, USA
  • fYear
    2003
  • fDate
    19-23 Jan. 2003
  • Firstpage
    522
  • Lastpage
    525
  • Abstract
    In this paper, we introduce a new method to fabricate Capacitive Micromachined Ultrasonic Transducers (CMUT) that uses a wafer-bonding technique. The transducer membrane and cavity are defined separately on a Silicon-On-Insulator (SOI) wafer and on a prime quality silicon wafer, respectively. Using silicon direct bonding in a vacuum environment, the two wafers are bonded forming the transducer. This new process offers many advantages over surface micromachining on the fabrication of the transducers with different cavity and membrane configurations. CMUTs with different dimensions have been successfully fabricated and characterized. For the first time, sub-MHz operation is achieved with CMUTs. The test results show that the new process is a promising method to fabricate CMUTs for operation in air and water at different frequency ranges.
  • Keywords
    micromachining; silicon-on-insulator; ultrasonic transducers; wafer bonding; SOI wafer; capacitive micromachined ultrasonic transducers; cavity; fabrication process; frequency ranges; surface micromachining; transducer membrane; wafer-bonding technique; Biomembranes; Fabrication; Frequency; Insulation; Micromachining; Piezoelectric transducers; Silicon; Sputtering; Ultrasonic transducers; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-7744-3
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2003.1189801
  • Filename
    1189801