• DocumentCode
    3333980
  • Title

    An in-situ end-point detector for parylene CVD deposition

  • Author

    Sutomo, Wongso ; Wang, Xuefeng ; Bullen, David ; Braden, Sarah K. ; Liu, Chang

  • Author_Institution
    Micro Actuators, Sensors & Syst. Group, Illinois Univ., Urbana, IL, USA
  • fYear
    2003
  • fDate
    19-23 Jan. 2003
  • Firstpage
    598
  • Lastpage
    601
  • Abstract
    We present the results of the development of an in situ end-point detector for a parylene chemical vapor deposition process. The detector is based on the thermal transfer principle and can be implemented on commercial parylene deposition systems with minimal system modification. Such a sensor enables a user to stop the deposition when a targeted thickness is reached. The end point detector is very simple to implement on existing parylene deposition systems. A series of such sensors with different target deposition thickness would allow extraction of the actual deposition rate within a deposition run.
  • Keywords
    chemical vapour deposition; dielectric thin films; micromachining; polymer films; process monitoring; thickness measurement; deposition rate extraction; detector implementation; in-situ end-point detector; parylene CVD deposition; parylene chemical vapor deposition process; sensor; system modification; target deposition thickness; thermal transfer principle; Chemical sensors; Chemical vapor deposition; Control systems; Detectors; Dielectric materials; Laboratories; Temperature sensors; Thermal conductivity; Thermal sensors; Thickness control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-7744-3
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2003.1189820
  • Filename
    1189820