DocumentCode
3342640
Title
Performance evaluation of top contact PANI organic thin film transistors with SiO2 and poly(methyl methacrylate) as gate dielectrics
Author
Parameshwara, S. ; Renukappa, N.M.
Author_Institution
Dept. of Electron. & Commun. Eng., Nat. Inst. of Eng., Mysore, India
fYear
2013
fDate
June 30 2013-July 4 2013
Firstpage
568
Lastpage
571
Abstract
Organic thin film transistors (OTFTs) were fabricated using polyaniline (PANI) of 3wt.% concentration, as the active layer with two different gate dielectrics, namely silicon dioxide (SiO2) and poly(methyl methacrylate) (PMMA), in top contact geometry for comparative studies. To deal with poor stability and large leakage currents between source/drain and gate electrodes, isolated OTFTs with reduced source/drain contact area were fabricated by selective deposition of PANI on SiO2 through shadow mask. The effects of the PMMA thickness on the performance of OTFTs has been investigated. The results analysis of the PMMA-based OTFTs exhibited encouraging performance because of their good dielectric characteristics as compared to SiO2.
Keywords
dielectric materials; leakage currents; organic field effect transistors; polymers; silicon compounds; thin film transistors; OTFT; PMMA thickness effect; SiO2; dielectric characteristics; gate dielectrics; gate electrodes; leakage currents; performance evaluation; poly(methyl methacrylate); polyaniline; source-drain contact area; source-drain electrodes; top contact PANI organic thin film transistors; top contact geometry; Dielectric constant; Logic gates; Organic thin film transistors; Plastics; Threshold voltage; Organic thin film transistors; Polyaniline; isolated OTFTs; poly(methyl methacrylate); top contact;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid Dielectrics (ICSD), 2013 IEEE International Conference on
Conference_Location
Bologna
ISSN
2159-1687
Print_ISBN
978-1-4799-0807-3
Type
conf
DOI
10.1109/ICSD.2013.6619808
Filename
6619808
Link To Document