DocumentCode
3345688
Title
Properties of polycrystalline GaAs films grown on CMG coverglass for space solar cell application
Author
Ogayu, Kenji ; Imaizumi, Mitsuru ; Soga, Tetsuo ; Jimbo, Takashi ; Umeno, Masayoshi
Author_Institution
Dept. of Environ. Technol. & Urban Planning, Nagoya Inst. of Technol., Japan
fYear
2002
fDate
19-24 May 2002
Firstpage
1066
Lastpage
1069
Abstract
Polycrystalline GaAs films have been grown on Pilkington CMG cover-glass as a substrate at relatively low temperature by MOCVD. The substrate temperature (Ts) was varied from 450°C to 550°C, while other conditions were kept constant. Preferential orientation and grain size of the films grown at ≥500°C are proved to be [111] and 0.5-1.0μm by XRD and AFM, respectively. Both of the absorption coefficient and the optical bandgap are found to be equivalent to those of single crystal GaAs. Photoluminescence is confirmed from doped GaAs films at RT and from undoped films at 77K, both of which have not been observed in the case of using a quartz substrate. The films are considered to be applicable for space solar cells.
Keywords
III-V semiconductors; MOCVD coatings; X-ray diffraction; atomic force microscopy; gallium arsenide; grain size; photoluminescence; semiconductor growth; semiconductor thin films; solar cells; solar power satellites; 0.5 to 1.0 micron; 450 to 550 C; 77 K; CMG coverglass; GaAs; MOCVD; absorption coefficient; grain size; optical bandgap; photoluminescence; polycrystalline GaAs films; preferential orientation; space solar cell application; substrate temperature; Absorption; Gallium arsenide; Grain size; MOCVD; Optical films; Photoluminescence; Photonic band gap; Photovoltaic cells; Temperature; X-ray scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2002. Conference Record of the Twenty-Ninth IEEE
ISSN
1060-8371
Print_ISBN
0-7803-7471-1
Type
conf
DOI
10.1109/PVSC.2002.1190790
Filename
1190790
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