• DocumentCode
    3350480
  • Title

    Hydrogen-related burn-in in GaAs/AlGaAs HBTs and implications for reliability

  • Author

    Henderson, T. ; Ley, V. ; Kim, T. ; Moise, T. ; Hill, D.

  • Author_Institution
    Corp. R&D, Texas Instrum. Inc., Dallas, TX, USA
  • fYear
    1996
  • fDate
    8-11 Dec. 1996
  • Firstpage
    203
  • Lastpage
    206
  • Abstract
    We report a burn-in effect in carbon-doped GaAs/AlGaAs HBTs that results in an increase in dc current gain. The burn-in is the result of the annihilation of hydrogen-related recombination centers due to electron injection into the base. This burn-in effect needs to be taken into account in long-term bias stress testing of HBTs. Unrealistic values of mean time to failure and activation energy may be calculated otherwise.
  • Keywords
    III-V semiconductors; aluminium compounds; electron-hole recombination; failure analysis; gallium arsenide; heterojunction bipolar transistors; semiconductor device reliability; semiconductor device testing; GaAs-AlGaAs; HBTs; activation energy; burn-in effect; dc current gain; electron injection; long-term bias stress testing; mean time to failure; recombination center annihilation; reliability; Annealing; Doping; Electrons; Gallium arsenide; Heterojunction bipolar transistors; Hydrogen; Instruments; Occupational stress; Spontaneous emission; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1996. IEDM '96., International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-3393-4
  • Type

    conf

  • DOI
    10.1109/IEDM.1996.553568
  • Filename
    553568