DocumentCode
3352545
Title
Development of the yield enhancement system of a high-volume 8-inch wafer fab
Author
Wang, Ping ; Chan, Mike ; Goodner, Ray ; Lee, Fourmun ; Ceton, Ron
Author_Institution
MOS 12 Die Manuf., Motorola Inc., Chandler, AZ, USA
fYear
1995
fDate
17-19 Sep 1995
Firstpage
51
Lastpage
52
Abstract
This presentation describes the development of a state-of-the-art, proactive yield enhancement system during the startup of Motorola´s latest high-volume 8-inch MOS 12 fab. The system has demonstrated rapid defect and failure analysis capability, resulting in fast problem identification and providing yield enhancement engineers with information for continuous yield improvement
Keywords
failure analysis; integrated circuit yield; 8 inch; MOS 12; Motorola; defect analysis; failure analysis; high-volume wafer fab; yield enhancement system; Electron beams; Failure analysis; Floppy disks; Information analysis; Inspection; Ion beams; Probes; Scanning electron microscopy; Semiconductor device manufacture; Semiconductor device modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on
Conference_Location
Austin, TX
Print_ISBN
0-7803-2928-7
Type
conf
DOI
10.1109/ISSM.1995.524357
Filename
524357
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