Control of fine particulate and gaseous contaminants by UV/photoelectron method

Author

Seto, Takafumi ; Yokoyama, Shin ; Okuyama, Kikuo ; Hirose, Masataka ; Fujii, Toshiaki ; Suzuki, Hidetomo

Author_Institution

Dept. of Chem. Eng., Hiroshima Univ., Japan

fYear

1995

fDate

17-19 Sep 1995

Firstpage

60

Lastpage

63

Abstract

In semiconductor manufacturing processes, surface contamination is a very important issue because it decreases the product yield of the LSI. In this study, a new method to remove fine airborne particles and gaseous contaminants in the wafer stocker using a UV/photoelectron method has been investigated. Two kinds of wafer stockers are used for investigating the efficiency of the UV/photoelectron method for controlling (1) particulate and gaseous contaminants under atmospheric conditions and (2) particulate contaminants under low pressure conditions

Keywords

photoemission; semiconductor technology; surface contamination; LSI; UV/photoelectron method; atmospheric conditions; gaseous contaminants; low pressure conditions; particulate contaminants; product yield; semiconductor manufacturing; surface contamination control; wafer stocker; Chemical engineering; Control systems; Electrodes; Hydrocarbons; Lamps; Pollution measurement; Semiconductor diodes; Space technology; Surface contamination; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on

Conference_Location

Austin, TX

Print_ISBN

0-7803-2928-7

Type

conf

DOI

10.1109/ISSM.1995.524360

Filename

524360