DocumentCode :
3352668
Title :
A C-Switch cell for low-voltage operation and high-density SRAMs
Author :
Kuriyama, H. ; Ishigaki, Y. ; Fujii, Y. ; Maegawa, S. ; Maeda, S. ; Miyamoto, S. ; Tsutsumi, K. ; Miyoshi, H.
Author_Institution :
LSI Res. & Dev. Lab., Mitsubishi Electr. Corp., Itami, Japan
fYear :
1996
fDate :
8-11 Dec. 1996
Firstpage :
279
Lastpage :
282
Abstract :
We propose a novel single-bit-line SRAM cell called a Complementary-Switch (C-Switch) cell. This cell features a C-Switch which combines an n-channel bulk transistor and a p-channel TFT in parallel. Through the use of a single-bit-line architecture with the C-Switch and a high performance TFT called Gate-All-around TFT (GAT), the proposed cell achieves both stable operation at 1.5 V and a size reduction of 16% when compared to conventional structures. Moreover, we have realized this cell using only a triple poly-Si and one metal process on a 0.3 /spl mu/m design rule.
Keywords :
SRAM chips; field effect transistor switches; thin film transistors; 0.3 micron; 1.5 V; C-Switch cell; Complementary-Switch cell; Gate-All-around TFT; high-density SRAM; low-voltage operation; metal process; n-channel bulk transistor; p-channel TFT; single-bit-line architecture; triple poly-Si; Electrodes; Equivalent circuits; Fabrication; Laboratories; Low voltage; Random access memory; Thin film transistors; Timing; Ultra large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1996. IEDM '96., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-3393-4
Type :
conf
DOI :
10.1109/IEDM.1996.553584
Filename :
553584
Link To Document :
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