RTP multivariable temperature controller development

Multivariable temperature controllers were developed and implemented in real-time for the applied materials rapid thermal processing (RTP) chamber for 125, 150, and 200 mm silicon wafers. The controllers were used for oxidation and annealing processes during semiconductor integrated circuit manufacturing. The resulting data, show that the developed controllers successfully controlled the wafer temperatures at multiple points across the wafer, maintaining repeatable operating conditions to insure consistent uniformity. The developed controllers were able to provide performance not achievable by manual tuning of an existing PID controller.