DocumentCode
3353301
Title
Nanolithography ߝ nanoimprinting
Author
Nevludov, I.Sh. ; Palagin, V.A. ; Frizuk, E.A.
Author_Institution
Kharkov Nat. Univ. of Radio Electron., Kharkov
fYear
2007
fDate
20-22 June 2007
Firstpage
63
Lastpage
67
Abstract
In the article are represented the analysis of existent methods of nanolithography on the example of nanoimprinting, features of technological processes with the use of nanoimprinting, advantages and lacks of different methods and direction of their application are appraised.
Keywords
X-ray lithography; electron beam lithography; masks; nanolithography; ultraviolet lithography; UV curing lithography; X-ray lithography; electron-beam lithography; lithographic mask; microelectronic devices; nanocontact print; nanoimprinting; nanolithography; photolithography; Electron beams; Electron emission; Lithography; Nanolithography; Optical devices; Optical distortion; Optical films; Optical materials; Resists; X-ray diffraction;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronic Physics and Technology, 2007. OPT '07. International Workshop on
Conference_Location
Kharkov
Print_ISBN
1-4244-1321-4
Electronic_ISBN
1-4244-1322-2
Type
conf
DOI
10.1109/OPT.2007.4298538
Filename
4298538
Link To Document