DocumentCode :
3354585
Title :
Wet rapid thermal oxidation of vertical cavity surface emitting laser structures with pyrogenic steam generator
Author :
Gutt, Thomas ; Chung, Hin Yiu Anthony ; Feldmeyer, Gerd Joehen
Author_Institution :
Infineon Technol. AG, Munich
fYear :
2004
fDate :
2004
Firstpage :
135
Lastpage :
142
Abstract :
In this article, the successful application of rapid thermal oxidation (RTO) with steam ambient for the selective oxidation of high aluminum containing embedded AlGaAs layer for the formation of current aperture in VCSELs is reported. The steam generation is achieved by the pyrogenic steam generation approach in which hydrogen and oxygen gas mixture is converted into steam by autoignition. Comparing to conventional furnace oxidation, steam-RTO showed a 6 times higher oxidation rate and an excellent oxidation uniformity across 4 inch wafers. It was also observed that after steam-RTO the Cr/Pt/Au p-type contacts had a 50% reduction in specific contact resistance compared to those oxidized in a conventional furnace
Keywords :
III-V semiconductors; aluminium compounds; boilers; chromium; contact resistance; gold; oxidation; platinum; rapid thermal processing; semiconductor technology; semiconductor-metal boundaries; surface emitting lasers; AlGaAs-Cr-Pt-Au; VCSEL; aluminum; contact resistance; current aperture; pyrogenic steam generator; vertical cavity surface emitting laser structures; wet rapid thermal oxidation; Aluminum; Apertures; Chromium; Contact resistance; Furnaces; Gold; Hydrogen; Oxidation; Surface emitting lasers; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. 12th IEEE International Conference on
Conference_Location :
Portland, OR
Print_ISBN :
0-7803-8477-6
Type :
conf
DOI :
10.1109/RTP.2004.1441950
Filename :
1441950
Link To Document :
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