• DocumentCode
    3358869
  • Title

    Commentary: Carbon-based Electrical Interconnect and Thermal Interface Materials

  • Author

    Yang, Cary

  • Author_Institution
    Center for Nanostruct., Santa Clara Univ., Santa Clara, CA
  • fYear
    2008
  • fDate
    18-18 April 2008
  • Abstract
    Summary form only given: As integrated circuit (IC) technology continues the trend towards sub-50 nanometer feature sizes, it is imperative to retain performance of back-end features such as on-chip interconnects while gaining the cost benefit of scaling. Some major barriers to achieving continuous downward scaling include high resistance and questionable reliability of nanoscale copper lines, and power dissipation in densely packed integrated circuits. This work presents fundamental electrical and thermal characterization of carbon nanofibers (CNF) as a possible solution for next-generation back-end integrated circuit processing. Results of temperature-dependent electrical resistance measurements for CNF arrays demonstrate distinct metallic behavior of these novel nanoscale devices. The current capacity of CNF interconnect test structures is examined and the results are compared with an electrothermal transport model. The use of CNF/copper composite material as a thermal interface for IC packaging is explored and fundamental thermal resistance measurement results show promise of such a composite material for thermal management applications.
  • Keywords
    carbon fibres; composite material interfaces; integrated circuit interconnections; integrated circuit packaging; nanoelectronics; nanostructured materials; thermal management (packaging); CNF; IC interconnects; IC packaging; back-end features; back-end integrated circuit processing; carbon nanofibers; integrated circuit technology; nanometer feature size; nanoscale copper lines; power dissipation; thermal interface materials; thermal management; thermal resistance measurement; Composite materials; Copper; Electric resistance; Electrical resistance measurement; Integrated circuit interconnections; Integrated circuit technology; Nanocomposites; Organic materials; Thermal management; Thermal resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics and Electron Devices, 2008. WMED 2008. IEEE Workshop on
  • Conference_Location
    Boise, ID
  • Print_ISBN
    978-1-4244-2343-9
  • Type

    conf

  • DOI
    10.1109/WMED.2008.4510651
  • Filename
    4510651