• DocumentCode
    3360417
  • Title

    Session 15 - IC Technology - more Moore and more than Moore

  • Author

    Loke, Alvin ; Lai, Jordan

  • Author_Institution
    Advanced Micro Devices, USA
  • fYear
    2008
  • fDate
    21-24 Sept. 2008
  • Abstract
    This session of exclusively invited papers covers a selection of key developments extending CMOS scaling as well as several non-CMOS technologies with pervasive applications. Included are an overview of lithography options beyond 45nm, high-K/metal-gate technology, high-speed BiCMOS, and opportunities orthogonal to conventional scaling.
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Custom Integrated Circuits Conference, 2008. CICC 2008. IEEE
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4244-2018-6
  • Type

    conf

  • DOI
    10.1109/CICC.2008.4672099
  • Filename
    4672099
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3360417