Title :
Optimizing 60-V integrated free-wheeling diode for automotive 0.8-μm Bi-CMOS-DMOS technology
Author :
Shekar, M.S. ; Cornell, Mike ; Williams, Richard K. ; Darwish, Mohamed
Author_Institution :
Siliconix Inc., Santa Clara, CA, USA
Abstract :
A cost-effective approach for integration and optimization of low substrate injection 60 V power diodes and 60 V complementary L-DMOS into a twin-well submicron VLSI CMOS process is addressed in this paper. Optimized free-wheeling (FW) diodes fabricated with stacked buried layers are shown to reduce substrate injection by 5 to 7 orders of magnitude compared to typical diodes. A built-in trade-off between the cell pitch and forced diode recovery time for the FW diode is analyzed using two-dimensional device simulations. The trade-offs associated with optimization of drain-engineered L-DMOS devices vs. power diodes are investigated through device simulations using MEDICI and SUPREM-IV and compared to experiments. An airbag controller power IC designed using this technology is experimentally demonstrated for the first time
Keywords :
BIMOS integrated circuits; VLSI; automotive electronics; buried layers; controllers; optimisation; power integrated circuits; power semiconductor diodes; semiconductor device models; 0.8 micron; 2D device simulations; 60 V; MEDICI device simulation; SUPREM-IV device simulation; airbag controller power IC; automotive Bi-CMOS-DMOS technology; cell pitch; complementary L-DMOS; cost-effectiveness; drain-engineered L-DMOS devices; forced diode recovery time; integrated free-wheeling diode optimization; integration; optimization; optimized free-wheeling diodes; power diodes; stacked buried layers; substrate injection; twin-well VLSI CMOS process; Anodes; Automotive engineering; Cathodes; Current density; Diodes; Electric breakdown; Immune system; MOS devices; Medical simulation; Voltage;
Conference_Titel :
Power Semiconductor Devices and ICs, 1998. ISPSD 98. Proceedings of the 10th International Symposium on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-4752-8
DOI :
10.1109/ISPSD.1998.702631