• DocumentCode
    3371946
  • Title

    InAs/InGaAs quantum dot laser with high ground-state modal gain grown by solid-source molecular-beam epitaxy

  • Author

    Chang, Fu-Yu ; Lee, Chi-Sen ; Liao, Gang-Hua ; Lin, Hao-Hsiung

  • Author_Institution
    Dept. of Electr. Eng. & Graduate Inst. of Electron. Eng., Nat. Taiwan Univ., Taipei, Taiwan
  • fYear
    2004
  • fDate
    31 May-4 June 2004
  • Firstpage
    461
  • Lastpage
    464
  • Abstract
    InAs self-organized quantum dots covered with In0.33Ga0.67As layer have been grown on GaAs substrates by solid-source molecular beam epitaxy. The effect of the InGaAs thickness has been discussed. As-cleaved 2.54-mm-long laser diode using triple stacks of InAs QDs covered with 6.0 ML In0.33Ga0.67As layer demonstrates a lasing wavelength of 1,214 nm and a threshold current density of 124 A/cm2. The ground-state saturation gain of 23 cm-1 is achieved due to an energy spacing of 85 meV between the ground and the first excited quantum dot levels and the high dot density.
  • Keywords
    III-V semiconductors; current density; gallium arsenide; indium compounds; molecular beam epitaxial growth; optical saturation; quantum dot lasers; semiconductor growth; 1214 nm; 2.54 mm; 85 meV; InAs-In0.33Ga0.67As; ground-state saturation gain; laser diode; quantum dot laser; self-organized quantum dots; solid-source molecular-beam epitaxy; threshold current density; Diode lasers; Gallium arsenide; Indium gallium arsenide; Laser excitation; Molecular beam epitaxial growth; Quantum dot lasers; Solid lasers; Substrates; Temperature; US Department of Transportation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-8595-0
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2004.1442757
  • Filename
    1442757