Ultra-Thick Optical Components using LF55GN Photosensitive Flexopolymer

We present the photosensitive flexopolymer LF55GN as a new material for the realisation of thick three-dimensional optical microstructures. Microstructures with a thickness up to 4 millimetres and with an aspect ratio of 10 can be realised using only a single UV exposure step and in a time frame of minutes. No baking process is required for the patterning of the LF55GN flexopolymer. The elastomeric nature of the material allows fabricating thick structures on flexible substrates and forces induced by the deformation of the flexible substrate are easily supported. Combining the casting method and UV lithography, thick optical components such as right-angle prisms with nearly vertical sidewalls and good surface quality are successfully fabricated.