Development of gas jet type Z-pinch EUV light source for lithography

Author

Song, I.H. ; Iwata, K. ; Homma, Yukio ; Mohanty, S.R. ; Watanabe, M. ; Kawamura, T. ; Okino, A. ; Yasuoka, K. ; Horioka, K. ; Hotta, E.

Author_Institution

Dept. of Energy Sci., Tokyo Inst. of Technol., Yokohama

fYear

2005

fDate

13-17 June 2005

Firstpage

1049

Lastpage

1052

Abstract

A new gas jet type Z-pinch source of 13.5 nm radiation, which has the characteristics of a gas jet electrodes configuration and the scheme for radial extraction of extreme ultraviolet (EUV) light, has been developed. The gas jet type Z-pinch discharge has two nozzles and two diffusers. The EUV beam is collected from the side of pinch plasma, generated in between the inner nozzle and corresponding diffuser, at the radial direction. The design feature of the gas jet type Z-pinch source accommodates the cylindrical annular shape helium (He) gas curtain that is produced by the outer nozzle. The dimension of pinch plasma is FWHM diameter of 0.07 mm and length of 0.34 mm. The EUV output in 2 % bandwidth at 13.5 nm is 0.78 mJ/sr/pulse.

Keywords

jets; nozzles; plasma flow; ultraviolet lithography; EUV light source; cylindrical annular shape helium gas; extreme ultraviolet light; gas jet electrodes configuration; gas jet type Z-pinch; lithography; radial extraction; Electrodes; Fault location; Helium; Light sources; Lithography; Particle beams; Plasma properties; Plasma sources; Shape; Ultraviolet sources;

fLanguage

English

Publisher

ieee

Conference_Titel

Pulsed Power Conference, 2005 IEEE

Conference_Location

Monterey, CA

Print_ISBN

0-7803-9189-6

Electronic_ISBN

0-7803-9190-x

Type

conf

DOI

10.1109/PPC.2005.300482

Filename

4084401