DocumentCode :
3373539
Title :
Temperature Dependent Mechanical Properties of Doped Silicon Microcantilevers
Author :
Lee, J. ; Goericke, F.T. ; King, W.P.
Author_Institution :
Georgia Inst. of Technol., Atlanta
fYear :
2007
fDate :
10-14 June 2007
Firstpage :
603
Lastpage :
606
Abstract :
This paper reports temperature dependent resonance frequency and quality factor of microcantilevers over the temperature range 25-175degC. Either local heating from integrated solid state resistors or uniform heating on a hotplate were employed. The microcantilevers were made of either boron-doped or phosphorus-doped single crystalline silicon. Both cantilever types showed decreasing resonant frequency with increasing temperature, and the cantilever mechanical quality factor was not a function of temperature over the temperature range tested. The presence of a silicon dioxide layer adjacent to the cantilever can affect the cantilever mechanical response, and so care must be taken to eliminate this layer.
Keywords :
Q-factor; cantilevers; micromechanical devices; resistors; semiconductor doping; boron-doped single crystalline silicon; doped silicon microcantilevers; hotplate; integrated solid state resistors; phosphorus-doped single crystalline silicon; quality factor; temperature 25 degC to 175 degC; temperature dependent mechanical properties; temperature dependent resonance frequency; Heating; Mechanical factors; Q factor; Resistors; Resonance; Resonant frequency; Silicon; Solid state circuits; Temperature dependence; Temperature distribution; microcantilever; quality factor; resonance frequency; stress; temaperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location :
Lyon
Print_ISBN :
1-4244-0842-3
Electronic_ISBN :
1-4244-0842-3
Type :
conf
DOI :
10.1109/SENSOR.2007.4300202
Filename :
4300202
Link To Document :
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