DocumentCode
3377523
Title
Minority carrier lifetime of silicon wafer passivated by PECVD amorphous silicon layers for silicon heterojunction solar cells
Author
Min Gu Kang ; Sung Ju Tark ; Lee, Jeong Chul ; Jeong Chul Lee ; Yoon, Kyung Hoon ; Song, Jinsoo ; Hee-jin Lim ; Donghwan Kim
Author_Institution
Department of Materials Science and Engineering, Korea University, Anam-dong, Seongbuk-gu, Seoul 137 - 713, South Korea
fYear
2008
fDate
11-16 May 2008
Firstpage
1
Lastpage
4
Abstract
Passivation is the one of important factors in the solar cells. The measurement of effectiveness of the passivation layer was based on quasi-steady-state photoconductance. In the case of the sample which was passivated using p-type amorphous silicon(a-Si:H), the minority carrier lifetime was 8.9μs. When the passivation layer was intrinsic a-Si:H, the minority carrier lifetime was 221.3μs. Considering the minority carrier lifetimes of both samples, silicon heterojunction solar cells were fabricated with and without intrinsic a-Si:H layer. the efficiency of the sample passivated with intrinsic amorphous silicon was 13.52%, whereas it was only 11.58% when this layer was not employed.
Keywords
Amorphous silicon; Charge carrier lifetime; Frequency; Heterojunctions; Passivation; Photoconductivity; Photovoltaic cells; Photovoltaic systems; Plasma temperature; Solar power generation;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
Conference_Location
San Diego, CA, USA
ISSN
0160-8371
Print_ISBN
978-1-4244-1640-0
Electronic_ISBN
0160-8371
Type
conf
DOI
10.1109/PVSC.2008.4922525
Filename
4922525
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