• DocumentCode
    3377523
  • Title

    Minority carrier lifetime of silicon wafer passivated by PECVD amorphous silicon layers for silicon heterojunction solar cells

  • Author

    Min Gu Kang ; Sung Ju Tark ; Lee, Jeong Chul ; Jeong Chul Lee ; Yoon, Kyung Hoon ; Song, Jinsoo ; Hee-jin Lim ; Donghwan Kim

  • Author_Institution
    Department of Materials Science and Engineering, Korea University, Anam-dong, Seongbuk-gu, Seoul 137 - 713, South Korea
  • fYear
    2008
  • fDate
    11-16 May 2008
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Passivation is the one of important factors in the solar cells. The measurement of effectiveness of the passivation layer was based on quasi-steady-state photoconductance. In the case of the sample which was passivated using p-type amorphous silicon(a-Si:H), the minority carrier lifetime was 8.9μs. When the passivation layer was intrinsic a-Si:H, the minority carrier lifetime was 221.3μs. Considering the minority carrier lifetimes of both samples, silicon heterojunction solar cells were fabricated with and without intrinsic a-Si:H layer. the efficiency of the sample passivated with intrinsic amorphous silicon was 13.52%, whereas it was only 11.58% when this layer was not employed.
  • Keywords
    Amorphous silicon; Charge carrier lifetime; Frequency; Heterojunctions; Passivation; Photoconductivity; Photovoltaic cells; Photovoltaic systems; Plasma temperature; Solar power generation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4244-1640-0
  • Electronic_ISBN
    0160-8371
  • Type

    conf

  • DOI
    10.1109/PVSC.2008.4922525
  • Filename
    4922525