Fabrication of Three-Dimensional Nano-Patterns by Inclined Nanoimprinting Lithography

We report a non-conventional nano fabrication approach, inclined nanoimprint lithography (INIL), which can produce three-dimensional (3D) nano-patterns of varying heights in a single imprinting step with the potential for low cost and high throughput. Such 3-D nano-patterns can be produced using soft lithography without the need for conventional nano-lithography of either the imprinting mold or the substrate, by exploiting the technique of anisotropic de-wetting. We demonstrate the INIL technique using a commercially available nanolithography resist, poly(methyl-alpha-chloroacrylate- co-alpha-methylstyrene), and demonstrate 3D pattern transfer to silicon dioxide using reactive ion etching.