• DocumentCode
    3380467
  • Title

    CMOS-Compatible Wafer-Level Microdevice-Distribution Technology

  • Author

    Guerre, R. ; Drechsler, U. ; Jubin, D. ; Despont, M.

  • Author_Institution
    IBM Zurich Res. Lab., Zurich
  • fYear
    2007
  • fDate
    10-14 June 2007
  • Firstpage
    2087
  • Lastpage
    2090
  • Abstract
    We present a novel cost-efficient heterogeneous device integration method based on the distribution principle. This robust, CMOS back end of the line (BEOL) compatible, wafer-scale device- selective transfer method for the batch fabrication of Systems-On-Chip is especially suitable for MEMS and ICs. The strategy for device selectivity during bonding and debonding is presented, and the demonstration of the technology is accomplished using AFM cantilevers as test vehicle. We have successfully selected a fraction of AFM devices from a single high-device-density "source" wafer and distributed them to populate many lower-device-density "receiver" wafers.
  • Keywords
    CMOS integrated circuits; atomic force microscopy; micromechanical devices; system-on-chip; wafer-scale integration; AFM cantilevers; CMOS-compatible wafer-level microdevice-distribution technology; MEMS; back end of the line; batch fabrication; heterogeneous device integration method; high-device-density; systems-on-chip; wafer-scale device-selective transfer method; CMOS technology; AFM; Heterogeneous device integration; Systems-On-Chip; wafer-scale 3D integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
  • Conference_Location
    Lyon
  • Print_ISBN
    1-4244-0842-3
  • Electronic_ISBN
    1-4244-0842-3
  • Type

    conf

  • DOI
    10.1109/SENSOR.2007.4300576
  • Filename
    4300576