• DocumentCode
    3380671
  • Title

    Modeling minority-carrier lifetime techniques that use transient excess-carrier decay

  • Author

    Johnston, Steven W. ; Berman, Gregory M. ; Ahrenkiel, Richard K.

  • Author_Institution
    National Renewable Energy Laboratory, Golden, CO 80401, USA
  • fYear
    2008
  • fDate
    11-16 May 2008
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    Details of the operation of a photoconductive decay technique called resonant-coupled photoconductive decay are revealed using modeling and circuit simulation. The technique is shown to have a good linear response over its measurement range. Experimentally measured sensitivity and linear response compare well to microwave reflection at low injection levels. We also measure the excess-carrier decay rate by an infrared free-carrier transient absorption technique and show comparable high injection level lifetimes.
  • Keywords
    Atomic layer deposition; Cathodes; Chemical processes; Controllability; Dry etching; Immune system; Plasma accelerators; Plasma chemistry; Silicon; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4244-1640-0
  • Electronic_ISBN
    0160-8371
  • Type

    conf

  • DOI
    10.1109/PVSC.2008.4922677
  • Filename
    4922677