DocumentCode
3380671
Title
Modeling minority-carrier lifetime techniques that use transient excess-carrier decay
Author
Johnston, Steven W. ; Berman, Gregory M. ; Ahrenkiel, Richard K.
Author_Institution
National Renewable Energy Laboratory, Golden, CO 80401, USA
fYear
2008
fDate
11-16 May 2008
Firstpage
1
Lastpage
6
Abstract
Details of the operation of a photoconductive decay technique called resonant-coupled photoconductive decay are revealed using modeling and circuit simulation. The technique is shown to have a good linear response over its measurement range. Experimentally measured sensitivity and linear response compare well to microwave reflection at low injection levels. We also measure the excess-carrier decay rate by an infrared free-carrier transient absorption technique and show comparable high injection level lifetimes.
Keywords
Atomic layer deposition; Cathodes; Chemical processes; Controllability; Dry etching; Immune system; Plasma accelerators; Plasma chemistry; Silicon; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
Conference_Location
San Diego, CA, USA
ISSN
0160-8371
Print_ISBN
978-1-4244-1640-0
Electronic_ISBN
0160-8371
Type
conf
DOI
10.1109/PVSC.2008.4922677
Filename
4922677
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