Title :
The atomic hydrogen flux during microcrystalline silicon solar cell deposition
Author :
van de Sanden, M.C.M. ; Dingemans, G. ; van den Donker, M.N. ; Hrunski, D. ; Gordijn, A. ; Kessels, W.M.M.
Author_Institution :
Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB, The Netherlands
Abstract :
Etch product detection by in situ optical emission spectroscopy is used to detect the phase transition from amorphous to microcrystalline silicon. In this contribution it is demonstrated that a calibrated version of this technique can be used to determine the absolute hydrogen flux under state-of-the-art silicon thin film deposition conditions.
Keywords :
Atom optics; Atomic layer deposition; Etching; Hydrogen; Optical films; Phase detection; Photovoltaic cells; Silicon; Spectroscopy; Stimulated emission;
Conference_Titel :
Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
Conference_Location :
San Diego, CA, USA
Print_ISBN :
978-1-4244-1640-0
Electronic_ISBN :
0160-8371
DOI :
10.1109/PVSC.2008.4922764
