Space environmental effects on thin film dielectrics

Author

Tennyson, R.C. ; Morison, W.D.

Author_Institution

Toronto Univ. Inst. for Aerosp. Studies, Downsview, Ont., Canada

fYear

1992

fDate

7-10 Jun 1992

Firstpage

13

Lastpage

16

Abstract

A general overview of the space environment is presented with particular emphasis on the effects of atomic oxygen (AO) and vacuum ultraviolet (VUV) radiation on the erosion of thin film dielectric materials. A description of a ground-based simulation facility is given together with experimental results, including comparisons with space flight data, for a variety of dielectrics. Protective coatings were also examined using quartz crystal microbalances to obtain in-situ mass loss measurements. Electrical property test results are presented for both uncoated and coated dielectrics in terms of their charge dissipation and arc discharge characteristics

Keywords

aerospace simulation; arcs (electric); dielectric thin films; electric breakdown of solids; environmental degradation; insulation; protective coatings; radiation effects; Kapton; VUV; arc discharge characteristics; atomic O effect; charge dissipation; coated dielectrics; erosion; ground-based simulation facility; in-situ mass loss measurements; protective coatings; quartz crystal microbalances; space environmental effects; space flight data; thin film dielectric materials; uncoated dielectric; vacuum ultraviolet radiation; Aerospace simulation; Atomic measurements; Coatings; Dielectric loss measurement; Dielectric materials; Dielectric measurements; Dielectric thin films; Loss measurement; Protection; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Electrical Insulation, Conference Record of the 1992 IEEE International Symposium on

Conference_Location

Baltimore, MD

ISSN

1089-084X

Print_ISBN

0-7803-0649-X

Type

conf

DOI

10.1109/ELINSL.1992.247063

Filename

247063