DocumentCode
3386944
Title
Trench IGBT with carrier bypass region
Author
Zehong Li ; Qian, Mengliang ; Ma, Rongyao ; Zhang, Bo ; Li, Zhaoji
fYear
2009
fDate
23-25 July 2009
Firstpage
624
Lastpage
627
Abstract
A new trench IGBT with carrier bypass region is proposed in paper. In this new structure, P+ bypass regions are introduced, which provided hole carrier bypass, reduced the parasitic thyristor effect in the trench IGBT, allowed higher safe operating area. The results are shown that the temperature characteristic of the new trench IGBT is better than that of the conventional trench IGBT. The metal which contacts the bypass regions and the emitters helps the thermal dissipation at high temperature and reduces the emitter contact resistance.
Keywords
insulated gate bipolar transistors; P+ bypass region; carrier bypass region; parasitic thyristor effect; thermal dissipation; trench IGBT; Bipolar transistors; Charge carrier processes; Contact resistance; Current density; Impedance; Insulated gate bipolar transistors; Temperature; Thermal resistance; Thyristors; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Communications, Circuits and Systems, 2009. ICCCAS 2009. International Conference on
Conference_Location
Milpitas, CA
Print_ISBN
978-1-4244-4886-9
Electronic_ISBN
978-1-4244-4888-3
Type
conf
DOI
10.1109/ICCCAS.2009.5250426
Filename
5250426
Link To Document