Title :
InAs/GaAs quantum dot lasers
Author :
Schmidt, O.G. ; Kirstaedter, N. ; Ledentsov, N.N. ; Bimberg, D. ; Ustinov, V.M. ; Egorov, A.Yu. ; Zhukov, A.E. ; Maximov, M.V. ; Kop´ev, P.S. ; Alferov, Zh.I.
Author_Institution :
Inst. fur Festkorperphys., Tech. Univ. Berlin, Germany
Abstract :
Quantum dot (QD) structures are believed to provide a promising way for a new generation of injection lasers. Intrinsic properties of QD lasers such as strongly increased gain and differential gain, ultra low threshold current density and high characteristic temperature are theoretically predicted. Some of these characteristics are experimentally verified at liquid nitrogen temperatures on realistic device structures. Due to small dot densities in the range of 5×10 10 cm-2 single layer quantum dot (SLQD) lasers exhibit a very small confinement factor and thus lack the ability to serve as high power lasers. The dot density within the active region can be increased by stacking the dot layers vertically on top of each other. The threshold current behaviour of a stacked QD laser is compared with that of a single layer QD laser. We demonstrate for the first time room temperature lasing of a stacked QD laser via the QD ground state
Keywords :
III-V semiconductors; current density; gallium arsenide; indium compounds; optical losses; quantum well lasers; semiconductor quantum dots; InAs-GaAs; InAs/GaAs quantum dot lasers; QD ground state; confinement factor; differential gain; dot density; gain; high characteristic temperature; injection lasers; internal losses; quantum dot structures; room temperature lasing; single layer quantum dot lasers; stacked QD laser; threshold current density; Gallium arsenide; Laser theory; Mirrors; Molecular beam epitaxial growth; Optical device fabrication; Power lasers; Quantum dot lasers; Temperature; Threshold current; US Department of Transportation;
Conference_Titel :
Indium Phosphide and Related Materials, 1996. IPRM '96., Eighth International Conference on
Conference_Location :
Schwabisch-Gmund
Print_ISBN :
0-7803-3283-0
DOI :
10.1109/ICIPRM.1996.492398