• DocumentCode
    3389043
  • Title

    Wavy Channel architecture thin film transistor (TFT) using amorphous zinc oxide for high-performance and low-power semiconductor circuits

  • Author

    Hanna, Amir N. ; Hussain, Aftab M. ; Hussain, Muhammad M.

  • Author_Institution
    Integrated Nanotechnol. Lab., King Abdullah Univ. of Sci. & Technol., Thuwal, Saudi Arabia
  • fYear
    2015
  • fDate
    21-24 June 2015
  • Firstpage
    201
  • Lastpage
    202
  • Abstract
    We report a Wavy Channel (WC) architecture thin film transistor (TFT) for extended device width by integrating continuous vertical fin like features with lateral continuous plane in the substrate. For a WC TFT which has 50% larger device width, the enhancement in the output drive current is 100%, when compared to a conventional planar TFT consuming the same chip area. This current increase is attributed to both the extra width and enhanced field effect mobility due to corner effects. This shows the potential of WC architecture to boast circuit performance without the need for aggressive gate length scaling.
  • Keywords
    II-VI semiconductors; amorphous semiconductors; low-power electronics; semiconductor device models; thin film transistors; wide band gap semiconductors; TFT; ZnO; field effect mobility; low-power semiconductor circuits; Dielectrics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2015 73rd Annual
  • Conference_Location
    Columbus, OH
  • Print_ISBN
    978-1-4673-8134-5
  • Type

    conf

  • DOI
    10.1109/DRC.2015.7175633
  • Filename
    7175633