• DocumentCode
    3389413
  • Title

    Automation of wafer handling in legacy semiconductor fab-a true cultural change

  • Author

    Guldi, Richard L. ; Whitfield, Martin T. ; Paradis, Douglas E. ; Poag, Frank D. ; Jensen, David P.

  • Author_Institution
    Texas Instrum. Inc., Dallas, TX, USA
  • fYear
    1997
  • fDate
    10-12 Sep 1997
  • Firstpage
    120
  • Lastpage
    125
  • Abstract
    When yield analysis revealed extensive die losses associated with wafer scratches, our fab management commissioned a comprehensive program to completely eliminate manual handling of wafers during manufacturing. This experience constituted a true cultural change for our legacy fab, which throughout a 15-year history had excelled at low cost, low cycle time manufacturing but had neglected fundamental improvements in wafer handling automation. This paper describes a team approach to quantifying the components of scratch associated yield loss, planning for remedial actions, and completing the task. Key ingredients for success included achieving buy-in at all levels of fab operations, effectively mobilizing fab resources and developing a group of indices to measure progress. As a result of these actions, our phase-1 program eliminated all manual wafer handling in our photolithography and contiguous plasma etch areas within a seven month period, reducing scratches on resist coated wafers by 83% and setting the stage for beginning additional phases of work to extend the automation to the rest of the fab
  • Keywords
    integrated circuit yield; management; materials handling; semiconductor device manufacture; die yield loss; management; manufacturing; photolithography; plasma etching; resist; scratching; semiconductor fab; wafer handling automation; Costs; Cultural differences; Etching; History; Lithography; Manufacturing automation; Plasma applications; Plasma measurements; Resists; Semiconductor device manufacture;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 1997. IEEE/SEMI
  • Conference_Location
    Cambridge, MA
  • ISSN
    1078-8743
  • Print_ISBN
    0-7803-4050-7
  • Type

    conf

  • DOI
    10.1109/ASMC.1997.630718
  • Filename
    630718