A novel CBCM method free from charge injection induced errors: investigation into the impact of floating dummy-fills on interconnect capacitance

Author

Chang, Y.W. ; Chang, H.W. ; Lu, T.C. ; King, Y. ; Ting, Wei-Yuan ; Ku, J. ; Lu, C.K.

Author_Institution

Technol. Dev. Center, Macronix Int. Co. Ltd., Hsinchu, Taiwan

fYear

2005

fDate

4-7 April 2005

Firstpage

235

Lastpage

238

Abstract

Starting from CIEF (charge injection induced errors) CBCM (charge-based capacitance measurement), a novel CBCM method free from the errors induced by charge-injection is developed. This is used for the first time to investigate the impact of floating dummy-fills on interconnect capacitance, in practice. The impact of floating dummy-fills is confirmed to play an important role on successful circuit design. Besides, a guideline to optimize the chip performance and minimize the crosstalk by dummy pattern design is also proposed in this paper.

Keywords

capacitance measurement; charge injection; circuit optimisation; crosstalk; integrated circuit design; integrated circuit interconnections; integrated circuit measurement; CBCM method; CIEF; charge injection induced error free method; charge-based capacitance measurement; chip performance optimization; crosstalk minimization; dummy pattern design; floating dummy-fill effects; interconnect capacitance; interconnect characterization; Capacitance; Capacitors; Circuit synthesis; Crosstalk; Guidelines; Integrated circuit interconnections; MOS devices; Probes; Testing; Ultra large scale integration;

fLanguage

English

Publisher

ieee

Conference_Titel

Microelectronic Test Structures, 2005. ICMTS 2005. Proceedings of the 2005 International Conference on

Print_ISBN

0-7803-8855-0

Type

conf

DOI

10.1109/ICMTS.2005.1452275

Filename

1452275