DocumentCode
3401192
Title
Properties and technology of sputtering of yttrium iron garnet films for spin-wave electronics
Author
Nikolaychuk, G.A. ; Yakovlev, S.V. ; Lutsev, L.V. ; Andreev, A.N. ; Filimonov, V.V.
Author_Institution
Res. Inst. "Ferrite-Domen", St. Petersburg
fYear
2008
fDate
8-12 Sept. 2008
Firstpage
552
Lastpage
553
Abstract
Deposition of yttrium iron garnet films produced by magnetron sputtering are considered. The main consideration is paid to technology methods to obtain stoichiometric composition of sputtered films.
Keywords
ferromagnetic materials; magnetic thin films; sputter deposition; yttrium compounds; Y3Fe5O12; magnetron sputtering; spin-wave electronics; stoichiometric composition; Garnet films; Iron; Magnetic analysis; Magnetic films; Performance analysis; Solids; Sputter etching; Sputtering; Surface contamination; Yttrium;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave & Telecommunication Technology, 2008. CriMiCo 2008. 2008 18th International Crimean Conference
Conference_Location
Sevastopol, Crimea
Print_ISBN
978-966-335-166-7
Electronic_ISBN
978-966-335-169-8
Type
conf
DOI
10.1109/CRMICO.2008.4676499
Filename
4676499
Link To Document