An electrostatically-tunable switching micromirror using [110] silicon wafers

Author

Kyoung-Sun Seo ; Young-Ho Cho ; Sung-Kie Youn

Author_Institution

Dept. of Mech. Eng., Korea Adv. Inst. of Sci. & Technol., Seoul, South Korea

fYear

1996

fDate

5-9 Aug. 1996

Firstpage

41

Lastpage

42

Abstract

A bulk-micromachined electrostatic micromirror has been designed, fabricated and tested for applications to tunable optomechanical switching microdevices. Static deflections of the micromirror have been measured up to 26.5 /spl mu/m with a DC threshold voltage of 330 V. Resonant switching frequencies have been tuned in the ranges of 580-450 Hz by varying the DC bias voltage within 50-300 V for an AC drive voltage of 10 V.

Keywords

electrostatic devices; elemental semiconductors; micromachining; micromechanical resonators; mirrors; optical fabrication; optical switches; semiconductor switches; silicon; tuning; 10 V; 26.5 mum; 330 V; 450 to 580 Hz; 50 to 300 V; AC drive voltage; DC bias voltage; DC threshold voltage; Si; [110] Si wafers; bulk-micromachined electrostatic micromirror; electrostatically-tunable switching micromirror; resonant switching frequencies; static deflections; tunable optomechanical switching microdevices; Anisotropic magnetoresistance; Electrostatics; Etching; Micromirrors; Mirrors; Optical devices; Optical filters; Optical modulation; Optical sensors; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Applications of Lasers in Materials Processing/Broadband Optical Networks/Smart Pixels/Optical MEMs and Their Applications. IEEE/LEOS 1996 Summer Topical Meetings:

Conference_Location

Keystone, CO, USA

Print_ISBN

0-7803-3175-3

Type

conf

DOI

10.1109/LEOSST.1996.540786

Filename

540786