DocumentCode
3407903
Title
1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144)
Volume
1
fYear
1998
fDate
22-26 June 1998
Abstract
The following topics were discussed: trends in devices and processing; advanced implantation systems; process control; ion-solid interactions; materials science aspects; emerging technologies and applications
Keywords
doping profiles; impurity distribution; ion implantation; particle beam diagnostics; semiconductor device manufacture; semiconductor doping; advanced implantation systems; ion implantation; ion-solid interactions; process control;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location
Kyoto, Japan
Print_ISBN
0-7803-4538-X
Type
conf
DOI
10.1109/IIT.1999.812036
Filename
812036
Link To Document