DocumentCode
3409529
Title
The excess energy of a low-energy ion beam extracted from a source plasma containing negative ions
Author
Sakudo, N. ; Hayashi, K. ; Kawasaki, Akari ; Ikenaga, N. ; Sakaguchi, N. ; Fujimura, K. ; Moriike, T. ; Okada, M. ; Maesaka, T. ; Ito, H.
Author_Institution
Kanazawa Inst. of Technol., Ishikawa, Japan
Volume
1
fYear
1999
fDate
1999
Firstpage
346
Abstract
A very low-energy ion beam of an energy level less than 100 eV needs exact evaluation for the energy value. Its energy value is inaccurate unless the plasma potential is taken into account with its total energy. The plasma potential causes the excess energy of a very low-energy ion beam. In this paper, we study the influence of negative ions on the excess energy. In a simple plasma model where the plasma consists only of electrons and singly-charged ions of a single specie, the plasma potential is proportional to the electron temperature. However, the real plasma for industrial use often contains some negative ions which also change the plasma potential. Theoretical study shows that the existence of negative ions decreases the plasma potential and accordingly lowers the excess energy
Keywords
ion beams; ion implantation; ion sources; negative ions; particle beam extraction; plasma production; excess energy; ion implantation; low-energy ion beam extraction; negative ions; plasma potential; simple plasma model; source plasma; Chemicals; Electrons; Ion beams; Ion sources; Plasma accelerators; Plasma applications; Plasma properties; Plasma sources; Plasma temperature; Potential energy;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location
Kyoto
Print_ISBN
0-7803-4538-X
Type
conf
DOI
10.1109/IIT.1999.812124
Filename
812124
Link To Document