• DocumentCode
    3409529
  • Title

    The excess energy of a low-energy ion beam extracted from a source plasma containing negative ions

  • Author

    Sakudo, N. ; Hayashi, K. ; Kawasaki, Akari ; Ikenaga, N. ; Sakaguchi, N. ; Fujimura, K. ; Moriike, T. ; Okada, M. ; Maesaka, T. ; Ito, H.

  • Author_Institution
    Kanazawa Inst. of Technol., Ishikawa, Japan
  • Volume
    1
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    346
  • Abstract
    A very low-energy ion beam of an energy level less than 100 eV needs exact evaluation for the energy value. Its energy value is inaccurate unless the plasma potential is taken into account with its total energy. The plasma potential causes the excess energy of a very low-energy ion beam. In this paper, we study the influence of negative ions on the excess energy. In a simple plasma model where the plasma consists only of electrons and singly-charged ions of a single specie, the plasma potential is proportional to the electron temperature. However, the real plasma for industrial use often contains some negative ions which also change the plasma potential. Theoretical study shows that the existence of negative ions decreases the plasma potential and accordingly lowers the excess energy
  • Keywords
    ion beams; ion implantation; ion sources; negative ions; particle beam extraction; plasma production; excess energy; ion implantation; low-energy ion beam extraction; negative ions; plasma potential; simple plasma model; source plasma; Chemicals; Electrons; Ion beams; Ion sources; Plasma accelerators; Plasma applications; Plasma properties; Plasma sources; Plasma temperature; Potential energy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology Proceedings, 1998 International Conference on
  • Conference_Location
    Kyoto
  • Print_ISBN
    0-7803-4538-X
  • Type

    conf

  • DOI
    10.1109/IIT.1999.812124
  • Filename
    812124