Motion Control of an Ultra Precision Positioning Stage

Motion control system of an ultra precision positioning stage with application to IC production is presented. Configuration and master/slave principle of ultra precision positioning stage are pictured. By adopting merits of both coarse and fine stage, a desired motion control system having the capacity of large workspace with high resolution of motion is enabled. The automated synthesis procedure of parallel PID controller and robust controller are developed using loop shaping techniques. Force decoupling strategy is introduced under the consideration of reality in practice. The simulation result shows that the positioning precision achieves to 10 nanometers using dual stage.