• DocumentCode
    3416699
  • Title

    Modeling of leakage current distributions in series connected polysilicon thin film transistors

  • Author

    Cheng, E. ; Sturm, J.C. ; Wu, I.W. ; King, T.J.

  • Author_Institution
    Dept. of Electr. Eng., Princeton Univ., NJ, USA
  • fYear
    1995
  • fDate
    25-26 Sep 1995
  • Firstpage
    107
  • Lastpage
    110
  • Abstract
    Leakage current is an important parameter in thin film transistors (TFTs) for achieving gray scales in active matrix liquid crystal displays (AMLCDs). Leakage regulation is especially important in polysilicon TFTs, where the leakage is significantly greater than in their amorphous silicon counterparts. To reduce the leakage current, it is a common practice to place two polysilicon TFTs in series, which may reduce the leakage current by over an order of magnitude. In this work, it is shown how leakage current in a series connected pair can be analytically predicted from the I-V characteristics of a single FET for the first time, and how the leakage current distribution of single transistors may affect the distribution of the series connected devices. These implications are important for estimating the pixel yield in AMLCDs from single device characteristics
  • Keywords
    current distribution; elemental semiconductors; leakage currents; liquid crystal displays; semiconductor device models; silicon; thin film transistors; AMLCD; I-V characteristics; Si; active matrix liquid crystal display; amorphous silicon counterparts; gray scales; leakage current distribution; leakage regulation; pixel yield; polysilicon TFT; series connected devices; series connected pair; series connected polysilicon thin film transistors; Active matrix liquid crystal displays; Amorphous silicon; FETs; Fabrication; Leakage current; Predictive models; Thin film transistors; Time series analysis; Voltage; Yield estimation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Active Matrix Liquid Crystal Displays, 1995. AMLCDs '95., Second International Workshop on
  • Conference_Location
    Bethlehem, PA
  • Print_ISBN
    0-7803-3056-0
  • Type

    conf

  • DOI
    10.1109/AMLCD.1995.540969
  • Filename
    540969