Title :
Vertical capacitive SiBARs
Author :
Pourkamali, Siavash ; Ho, Gavin K. ; Ayazi, Farrokh
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
fDate :
30 Jan.-3 Feb. 2005
Abstract :
This work introduces high frequency, vertical silicon bulk acoustic resonators (SiBAR). A combination of the new resonator structures with much larger transduction area and the HARPSS fabrication process is used to demonstrate high frequency capacitive resonators with significantly lower impedances compared to the previous capacitive resonators. Impedances as low as a few kilo-Ohms and quality factors in the range of 20,000 to 50,000 in the VHF range have been achieved for the first thickness mode of the fabricated resonators. Resonant frequencies as high as 983MHz are demonstrated for the third thickness modes of the capacitive SiBARs.
Keywords :
Q-factor; UHF devices; acoustic microwave devices; acoustic resonators; bulk acoustic wave devices; resonators; HARPSS fabrication process; high frequency SiBARs; high frequency capacitive resonators; quality factors; resonant frequency; resonator structures; vertical capacitive SiBARs; vertical silicon bulk acoustic resonators; Acoustic waves; Fabrication; Film bulk acoustic resonators; Impedance; Q factor; Resonant frequency; Resonator filters; Silicon; Surface acoustic waves; Wireless communication;
Conference_Titel :
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
Print_ISBN :
0-7803-8732-5
DOI :
10.1109/MEMSYS.2005.1453904